Intellectual Property Law

US Patent 7326293 - Multiple atomic layer patterning

By blaisemouttet

This patent from Zyvex teaches an multilayer patterning procedure using atoms, molecules, or nanoscale particles as the building blocks and naoimprint stamps or scanning probe tips as the fabrication tools. Claim 1 reads:

1. A method, comprising: patterning a layer by removing each of a plurality of nanoscale passivating particles which each passivate a corresponding one of a first plurality of nanoscale structural particles forming the layer; and depositing each of a second plurality of nanoscale structural particles on each of corresponding ones of the first plurality of nanoscale structural particles from which one of the plurality of nanoscale passivating particles was removed; wherein at least one of the patterning and the depositing is at least partially automated.

Full post as published by TinytechIP on February 05, 2008 (boomark / email).